Two-phase multiferroic nanostructures have the potential to display magnetoelectricity (ME) through interphase mechanical coupling. Nanoscale ME-based technology may lead to the next generation of computer memory. In this research, soft electron beam lithography (soft-eBL) was used to fabricate submicron-sized structures of cobalt ferrite (magnetostrictive) and barium titanate (piezoelectric) as bottom and top layers, respectively. Silicon and magnesium oxide [100] substrates were used, and the MgO substrate produced structures with a well-defined faceted appearance after annealing. Geometric characterization was performed with scanning electron microscopy (SEM) and atomic force microscopy (AFM). Magnetic force microscopy (MFM) was also used to observe the magnetic orientation of the cobalt ferrite layer on MgO.

Last modified

• 07/18/2018

Creator

• Vinayak Dravid
• Zixiao Pan
• Ken D'Aquila

DOI

• https://doi.org/10.21985/N2SM5R

Keyword

• Volume 4

Date created

• 2007

Resource type

• Article

Rights statement

• In Copyright