A self-assembled monolayer of an alkene or alkyne can be applied to a hydrogenpassivated silicon surface using UV hydrosilylation. This research shows that field-induced oxides can be used as a negative resist to selectively prevent bromostyrene attachment, providing a means of nanopatterning organic molecules on silicon. The negative resist effects were confirmed using AFM topography, lateral force microscopy, and secondary ion mass spectrometry. Evidence suggests that field-induced oxides also selectively replace bromostyrene on silicon. An attempt to apply a similar monolayer with octadecene was inconclusive.

Last modified

• 07/19/2018

Creator

• Christopher Liman

DOI

• https://doi.org/10.21985/N2X71P

Keyword

• Volume 5

Date created

• 2008

Resource type

• Article

Rights statement

• In Copyright